The resulting films were cleaned in double-deionized water and calcined at 450 °C to remove the TPAOH, resulting in porous PSZ MFI films with a uniform thickness of 300-450 nm.
The resulting films were cleaned in double-deionized water and calcined at 450 °C to remove the TPAOH, resulting in porous PSZ MFI films with a uniform thickness of 300-450 nm.
The resulting films were cleaned in double-deionized water and calcined at 450 °C to remove the TPAOH, resulting in porous PSZ MFI films with a uniform thickness of 300-450 nm.
The resulting films were cleaned in double-deionized water and calcined at 450 °C to remove the TPAOH, resulting in porous PSZ MFI films with a uniform thickness of 300-450 nm.
The resulting films were cleaned in double-deionized water and calcined at 450 °C to remove the TPAOH, resulting in porous PSZ MFI films with a uniform thickness of 300-450 nm.